Description
(overview with location bars)
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Version with a 500-200-100nm structure
(structure)
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This advanced CD calibration test specimen is suited for calibrating smaller structures. The 500-200-100nm test specimen comprises 3 line patterns, each identified by its pitch.
Each pattern has 5 bars and spaces with equal pitch: 500nm, 200nm and 100nm. The central area may be used for AFM measurements.
The patterns are etched into Si with a depth of approx. 45-50nm. There is no coating on the Si surface.
On some CD calibration targets one of the 100nm lines can be missing. This is a normal occurrence and does not influence performance of the specimen.
| Pattern Size | 500nm | 200nm | 100nm |
|---|---|---|---|
| Accuracy | 0.30% | 0.55% | 0.50% |
| Uniformity | 0.24% | 0.60% | 1.20% |
