Description

for SEM, FIB, and AFM

“Critical Dimension (CD) structures” are particularly useful for SEM / FIB magnification calibration and may be used for AFM.

Microscopists and engineers using high performance SEMs or FIB systems will find this calibration test specimen useful. The 4.8 x 4.8mm silicon standard has a series of patterns with a side length of 480 m around its edges, helpful for orientation. There are three versions available.

Version with a 10-5-2-1-0.5um structureThis CD calibration test specimen comprises 5 line patterns, each one clearly identified by its pitch. Each pattern has five bars and spaces of equal pitch:10.0um, 5.0 m, 2.0 m, 1.0 m and 0.5 m.

The central line area may be used for AFM measurements. The patterns are etched into Si with a depth of approximately 200nm.
There is no coating on the Si surface.

Two types are offered:

non-certified
certified by PTB (Physikalische Technische Bundesanstalt – German counter part of NIST)

and individually numbered.

Based on the measurement of 9 different standards, the accuracy and uniformity are:

Pattern Size	10 m	5 m	2 m	1 m	0.5 m
Accuracy	0.20%	0.22%	0.35%	0.56%	0.78%
Uniformity	0.27%	0.34%	0.53%	0.80%	1.2%

Additional information

Unit	Each

CD Structure 10-5-2-1-0.5 m, non-certified

Description

for SEM, FIB, and AFM

Additional information

Related products

CD Structure 10-5-2-1-0.5 m, certified

CD Structure 500-200-100nm, non-certified