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PELCO Hydrophilic and Hydrophobic Silicon Nitride Membrane Surfaces
Silicon Nitride membranes have been modified using Atomic Layer-Deposited (ALD) techniques to change their surface properties.
no. 21553-10 to 21597-10

Description

PELCO Hydrophilic and Hydrophobic Silicon Nitride Membrane Surfaces
15nm, 50nm and 200nm membrane thickness

Hydrophobic and Hydrophilic Silicon Nitride Membrane
Silicon Nitride membranes have been modified using Atomic Layer-Deposited (ALD) techniques to change their surface properties.
Depending on the process used, both Hydrophilic and Hydrophobic substrates have been created with the following advantages:

  • Choice between low and high surface energies
  • Smooth and conformal substrates
  • Enhanced wetting and biocompatibility (hydrophilic)
  • No need for plasma treatment of surface prior to cell growth
  • Hydrophobic coating offers novel platform for deposition and growth of nanomaterials

Hydrophobic surfaces improve sample preparation for materials that are dissolved or suspended in organics solvents.
Nanoparticles in organic solvents (such as carbon nanotubes) will readily disperse on the Silicon Nitride membrane surface.

Hydrophilic surfaces enhance wetting and dispersion of aqueous solutions. This avoids particle aggregation effects commonly observed on less hydrophilic surfaces. Particularly useful in water based sols and life science applications.

Both coatings are available on 50nm and 200nm PELCO Silicon Nitride Membranes with a 0.5 x 0.5mm window and 15nm Si3N4 membrane with 9 each 0.1 x 0.1nm windows on a 200 m silicon frame with a diameter of 3mm, compatible with all standard TEM grid holders. Both sides of the membrane and frame are coated.

We advise to handle the discs by gripping at the edge.

Specifications:

Hydrophilic: 2.5nm atomic layer-deposited hydroxylated alumina on 15, 50 and 200nm ultra-low-stress silicon nitride membrane
Hydrophobic: 2.5nm atomic layer-deposited alumina and fluoro-methyl-silane on 15, 50 and 200nm ultra-low-stress silicon nitride membrane
Surface Energy:

SurfaceSurface Energy (mJ/m2)Standard Deviation
Silicon Nitride Membrane46.14.3
Hydrophilic Coating76.12.2
Hydrophobic Coating24.64.4
mj= millijoules
  • Surface Roughness:
SurfaceSurface Roughness (nm)Standard Deviation
Silicon Nitride MembraneRq=0.65
Ra=0.45		0.06
0.02
Hydrophilic CoatingRq=0.57
Ra=0.40		0.04
0.03
Hydrophobic CoatingRq=0.66
Ra=0.40		0.03
0.05
Rq= Surface Roughness; Ra= Roughness Average
  • Film Thickness: Resilient, low stress 15, 50 and 200nm, giving rise to minimum absorption to enable clear imaging
  • Window Sizes: Array of 9 ea. 0.1 x 0.1mm and 0.5 x 0.5mm
  • Frame Thickness: Silicon support structure is 200 m standard.
  • Frame Diameter: EM standard 3mm diameter disc, fully compatible with standard TEM holders (no broken edges)
  • EasyGrip Edges for easy handling with tweezers
  • Packaging: The PELCO Silicon Nitride Support Films are packaged under cleanroom conditions in the PELCO #160 TEM Grid Storage box. Each box holds 10 support films.

Order

Art.Description Unit PriceQuantity
21553-10

PELCO Hydrophilic 15nm Silicon Nitride Membrane, 9 ea. 0.1×0.1mm Windows

 10 € 427,80
✓
21550-10

PELCO Hydrophilic 50nm Silicon Nitride Membrane, 0.5 x 0.5mm Window

 10 € 326,00
✓
21551-10

PELCO Hydrophilic 200nm Silicon Nitride Membrane, 0.5 x 0.5mm Window

 10 € 282,50
✓
21593-10

PELCO Hydrophobic 15nm Silicon Nitride Membrane, 9 ea. 0.1 x 0.1mm Windows

 10 € 427,80
✓
21552-10

PELCO Hydrophobic 50nm Silicon Nitride Membrane, 0.5 x 0.5mm Window

 10 € 326,00
✓
21591-10

PELCO Hydrophobic 200nm Silicon Nitride Membrane, 0.5 x 0.5mm Window

 10 € 282,50
✓
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