Allows to Apply Plasma to the Substrates

For specimen pre-treatment or after-treatment combined with a coating process the etching unit allows to apply plasma to the substrates.

With this accessory one can select Argon, extra etching gas or environmental air either as process gas.
This allows cleaning of the samples prior to a coating and increasing the adhesion of thin films.

Additionally it would be possible to modify the surface properties of a coated sample by a plasma treatment after the coating.
With air plasma it is possible to turn a thin carbon layer from hydrophobic to hydrophilic for example.

The adjustable process pressure ranges from 2 E-1 mbar to 1 mbar with a selectable plasma current from 10 to 50 mA.