Description

These 3mm Silicon discs have an ultra-flat (Ra 0.45 0.2nm) 50nm ultra-low-stress Silicon Nitride layer on both sides. Also available with a hydrophilic or hydrophobic surface coating or just as a silicon disk.
The disks are made with the same state-of-the-art manufacturing techniques as the PELCO Silicon Nitride Support Films.

The disk are perfectly round and have the Easygrip edge for easy handling.
Clean surface, no broken edges and free of debris often associated with other manufacturing processes.

The ultra-low-stress film is nonstoichiometric and closer to SiN than Si3N4. They can be used for a number of applications:

Specimen mounts for SEM and FESEM applications
Specimen discs for AFM applications
Blanks to build the PELCO Liquid Cell together with the PELCO Silicon Nitride Membrane

Product Specifications

Film Thickness: 50nm ultra-low-stress Silicon Nitride on both sides
Hydrophilic: 5nm atomic layer-deposited hydroxylated alumina on 50nm ultra-low-stress silicon nitride More Details
Hydrophobic: 5nm atomic layer-deposited alumina and fluoro-methylsilane on ultra-low-stress silicon nitride. More Details
Disk Thickness: 200 m silicon support
Disk Diameter: 3mm
Surface Roughness: The RMS (Rq) is 0.65 +/- 0.06nm which gives a mean roughness (Ra) of 0.45 +/- 0.02nm

Packaging: The PELCO Silicon Nitride Discs with hydrophilic or hydrophobic coating are packaged under cleanroom conditions. The discs are packed in a vial holding 10 discs.